SiC polish for high-performance optics
Optical surface quality on one of the hardest engineering materials
Silicon carbide (SiC) combines high stiffness, thermal stability, and low density – ideal properties for mirrors, structural components, and parts in space optics, semiconductor manufacturing, and lithography. The challenge lies in polishing: SiC surfaces must be comparable to highly polished glass – using a material that pushes conventional polishing methods to their limits.
01
Starting point
Challenge
The extreme hardness and brittleness of SiC make machining particularly challenging. Conventional polishing methods lead to long process times, high tool wear, and limited process stability. At the same time, sub-nanometre roughness values, the highest form accuracy, and minimal subsurface damage are demanded.
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OUR APPROACH
Solution
The VGP process, in combination with the PRECESS polishing technique, enables controlled material removal through uniform pressure distribution and defined kinematics. The result: optical surface quality on SiC — reproducible, efficient, and with significantly reduced processing times.
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Added value
Advantages
✓
Uniform removal
Uniform pressure distribution for constant surface quality over the entire component.
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Process stable
Reproducible results through stable, gravity-based process control.
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Cost-effective
Optimised tool wear reduces process costs.
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Geometryflexible
Processing complex shapes including aspheres.